Pegasus Computational Pattern Analytics
High-performance production-proven layout processing
Key Benefits
- In production use for 20+ years to process largest chip databases with unmatched performance
- Fully enabled with data analytics and machine learning
- Production-proven in the cloud with massive distribution and parallelization for faster throughput and linear scalability
- Wide range of applications at both major foundries and fabless semiconductor companies
- Versatile built-in and customizable applications
Cadence® Pegasus™ Computational Pattern Analytics (CPA) is an advanced high-performance, pattern-based technology suite comprising of mature production-proven flows and engines as well as new innovative approaches. Pegasus CPA includes feature rich capabilities in the pattern-search/classification/profiling domain while leveraging unique pattern engines such as Squish™ technology, machine-learning (ML), data analysis methods, Python-based scripting, and novel feature-extraction techniques. With Pegasus CPA, design and manufacturing teams can assess layout quality, automate design-quality improvements, accelerate design finishing prior to manufacturing, and develop powerful post-silicon layout analysis. Built-in features allow everyone from beginners to data scientists to leverage the power, capacity, and high performance of Pegasus CPA. Pegasus CPA delivers a richer feature set, more efficient processing capabilties,10-100X faster performance, and larger capacity than traditional DRC-based solutions.
Benefits
High performance
- Optimized algorithms and in-memory operations achieve unmatched processing speeds of up to 100X faster
- Full-chip analysis capability for the largest layout databases in most advanced nodes in hours, not days
- High-productivity CPA Studio GUI integrated in Pegasus Design Review enables faster analysis and dispositioning
Scalable
- Scales linearly with area and number of CPUs
- Easily handles from millions to billions of patterns, markers, and data sets
- Cloud production proven
High capacity
- Efficiently processes large full-chip layouts at the most advanced technology nodes
- Full-chip processing, optimization, data mining, model training, and pattern harvesting
- End-to-end flows have been developed to support up to billions of patterns with optimized CPU and memory usage
Production proven
- In production use at major foundries to screen incoming tapeouts
- Enables urgent and critical foundry production fixes
- Foundation of pattern databases used to gather, monitor, and mitigate yield detractors
- In-design optimizations using foundry kits improve the yield of incoming designs
Versatile applications
- Streamlined design optimization
- Single-pass, single-deck search and optimization
- Find exact or similar patterns based on pattern banks or ML models
- Automatically replace or optimize patterns during design implementation
- Score patterns based on built-in or customer criteria
- Increases recommended rules usage and DFM score using foundry kits to statistically improve yield
- Integrated in Innovus™ Implementation System, Virtuoso® Layout Suite, and Pegasus Design Review Environment
- Saves hours with automated DRC fixing
- Interactive layout analysis
- Interactive pattern capture, editing, search, profiling, and optimization integrated in Pegasus Design Review Environment
- Allows quick deck development, update, and validation
- Interactive GUI-driven flows with synchronized layout and results viewing
- Pattern analytics, profiling, and classification
- Automatically and quickly measures layout dimensions to generate pattern profiling reports and histograms
- Efficient layout feature extraction is fed into ML engine for powerful layout analytics
- Identifies most frequent patterns and outliers, and groups similar patterns
- Yield detractor monitoring
- ML-based hotspot prediction, feature extraction, and Python-based analytics
- Creation and maintenance of pattern database of yield detractors, including pattern scoring, complexity analysis, and similarity
- Enables systematic pattern-based dispositioning of yield detractors
- Pattern capture, generation, and enumeration
- Efficiently captures and compares full chip pattern databases with full coverage
- Pattern comparison identifies new layout patterns in incoming product
- Generates and varies patterns of interest within their context used for DRC deck validation and OPC calibration, and tests key generation for process hotspot coverage
- Hierarchy injection
- Creates hierarchical layout from flat layout or flattened layout
- Recovers hierarchy from layout that has been flattened
- Reduced database size and accelerates subsequent processing
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